Semiconductor apparatus, solid state imaging device, imaging apparatus and electronic equipment, and manufacturing method thereof

ABSTRACT

The present technology relates to a semiconductor apparatus, a solid state imaging device, an imaging apparatus and electronic equipment which realize a smaller and thinner size and which enable improvement of optical characteristics, and a manufacturing method thereof. A side electrode  16   c  is formed on a side face of a substrate on which an imaging device  16  is formed. By this side electrode  16   c  being connected to an electrode pad  15   b  on the substrate  15  through a chip wiring  17  formed with solder, the imaging device  16  is electrically connected to the substrate  15 . By this means, because it is possible to electrically connect the imaging device  16  to the substrate  15  without using wire bonding, space required for wire bonding is not required, so that it is possible to realize a smaller and thinner apparatus. The present technology can be applied to an imaging apparatus.

TECHNICAL FIELD

The present technology relates to a semiconductor apparatus, a solid state imaging device, an imaging apparatus and electronic equipment, and a manufacturing method thereof, and, more particularly, to a semiconductor apparatus, a solid state imaging device, an imaging apparatus and electronic equipment which realize a smaller and thinner size and which enable improvement of optical characteristics, and a manufacturing method thereof.

BACKGROUND ART

A technique has been proposed which improves optical characteristics upon assembly of a substrate on which an imaging device typified by a charge coupled device (CCD) and a complementary metal oxide semiconductor (CMOS) is assembled, and an optical system block constituted with a lens, or the like.

For example, it is known that, when there is a mounting wiring located below a light receiving surface, infrared light is transmissive to a bottom, and the infrared light reflected at the wiring appears in an output image.

Therefore, in order to prevent the light receiving surface from being illuminated with the reflected infrared light, a technique has been proposed which disposes the mounting wiring at an outer periphery of the light receiving surface and connects an electrode pad on a chip front face and an implementation pattern on a rear face with a side wiring (see Patent Literature 1).

CITATION LIST Patent Literature

Patent Literature 1: Patent Application No. 2007-165696

SUMMARY OF INVENTION Technical Problem

However, in the above-described technique, while a side portion is used as a wiring, because the side portion is not used as a mount terminal, and a wiring portion is protected, there is a risk of increasing assembly process.

The present technology has been made in view of such circumstances, and is intended to realize a smaller and thinner size by providing a terminal at a substrate side portion and improve optical characteristics by removing reflected light through wire bonding.

Solution to Problem

According to one aspect of the present technology, there is provided a semiconductor apparatus including: a chip substrate including a predetermined circuit; and an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside. The electrode terminal is provided on a side face of the chip substrate.

The electrode pad can be further included at an end portion of both or at least one of a front face and a rear face of the chip substrate, at a position corresponding to the electrode terminal provided on the side face of the chip substrate.

According to one aspect of the present technology, there is provided a solid state imaging device including: a chip substrate including a circuit of an imaging device; and an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside. The electrode terminal is provided on a side face of the chip substrate.

The electrode pad can be further included at an end portion of both or at least one of a front face and a rear face of the chip substrate, at a position corresponding to the electrode terminal provided on the side face of the chip substrate.

According to one aspect of the present technology, there is provided an imaging apparatus including: a chip substrate including a circuit of an imaging device; and an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside. The electrode terminal is provided on a side face of the chip substrate.

The electrode pad can be further included at an end portion of both or at least one of a front face and a rear face of the chip substrate, at a position corresponding to the electrode terminal provided on the side face of the chip substrate.

According to one aspect of the present technology, there is provided electronic equipment including: a chip substrate including a circuit of an imaging device; and an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside. The electrode terminal is provided on a side face of the chip substrate.

The electrode pad can be further included at an end portion of both or at least one of a front face and a rear face of the chip substrate, at a position corresponding to the electrode terminal provided on the side face of the chip substrate.

According to one aspect of the present technology, there is provided a manufacturing method of a semiconductor apparatus including a chip substrate including a predetermined circuit, and an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside, the electrode terminal being provided on a side face of the chip substrate, the manufacturing method including: a first step of forming a through-hole on the side face of the chip substrate, at a position on the wafer on which the electrode terminal is formed; a second step of applying metal forming the electrode terminal to the through-hole; and a third step of cutting out the chip substrate by cutting the wafer along the through-hole.

According to one aspect of the present technology, there is provided a manufacturing method of a solid state imaging device including a chip substrate including a circuit of an imaging device, and an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside, the electrode terminal being provided on a side face of the chip substrate, the manufacturing method including: a first step of forming a through-hole on the side face of the chip substrate, at a position on the wafer on which the electrode terminal is formed; a second step of applying metal forming the electrode terminal to the through-hole; and a third step of cutting out the chip substrate by cutting the wafer along the through-hole.

According to one aspect of the present technology, there is provided a manufacturing method of an imaging apparatus including a chip substrate including a circuit of an imaging device, and an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside, the electrode terminal being provided on a side face of the chip substrate, the manufacturing method including: a first step of forming a through-hole on the side face of the chip substrate, at a position on the wafer on which the electrode terminal is formed; a second step of applying metal forming the electrode terminal to the through-hole; and a third step of cutting out the chip substrate by cutting the wafer along the through-hole.

According to one aspect of the present technology, there is provided a manufacturing method of electronic equipment including a chip substrate including a circuit of an imaging device, and an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside, the electrode terminal being provided on a side face of the chip substrate, the manufacturing method including: a first step of forming a through-hole on the side face of the chip substrate, at a position on the wafer on which the electrode terminal is formed; a second step of applying metal forming the electrode terminal to the through-hole; and a third step of cutting out the chip substrate by cutting the wafer along the through-hole.

According to one aspect of the present technology, an electrode terminal which receives supply of an electrical signal or power supplied from outside or which supplies an electrical signal or power to be outputted to the outside is provided at a side face of a chip substrate including a predetermined circuit.

Advantageous Effects of Invention

According to one aspect of the present technology, it is possible to realize a smaller and thinner size and improve optical characteristics.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a diagram for explaining a configuration of one embodiment of an imaging apparatus to which the present technology is applied.

FIG. 2 is a diagram for explaining a structure of a side electrode of an imaging device in FIG. 1.

FIG. 3 is a flowchart for explaining manufacturing processing of the imaging device in FIG. 1.

FIG. 4 is a diagram for explaining a modified example of the imaging device to which the present technology is applied.

DESCRIPTION OF EMBODIMENTS

An embodiment for implementing the present technology (hereinafter, referred to as an embodiment) will be described below. It should be noted that description will be provided in the following order.

-   1. First Embodiment (Example Where Optical System Block is Assembled     on Glass Surface) -   2. Modified Example (Example Where Optical System Block is Assembled     on Frame)

1. FIRST EMBODIMENT <Configuration Example of Imaging Apparatus>

FIG. 1 is a block diagram illustrating a configuration example of one embodiment of an imaging apparatus to which the present technology is applied.

FIG. 1 illustrates a side face cross-sectional diagram near an imaging device and an optical system block, of the imaging apparatus, in which incident light is incident from above to below in the drawing.

In FIG. 1, an opening portion 15 a is provided at a substrate 15, and an imaging device 16 is connected via a chip wiring 17 at a position corresponding to the opening portion 15 a on a lower face of the substrate 15 in the drawing. Meanwhile, a glass plate 13 is provided on an upper face of the substrate 15.

Further, on the glass plate 13, a lens barrel portion 11 which includes an optical system block 12 having optical characteristics for both focusing and focus adjustment or either focusing or focus adjustment is provided, and fixed with an adhesive 14 applied on the substrate 15 and the glass plate 13.

According to a configuration as illustrated in FIG. 1, by incident light incident from above in the drawing being transmissive through the optical system block 12, the incident light is adjusted so as to be focused on the imaging device 16, transmissive through the glass pate 13 and incident on the imaging device 16. The imaging device 16, which is a solid state imaging device typified by a complementary metal-oxide semiconductor (CMOS), outputs an image signal constituted with a pixel signal generated through photoelectric conversion with the incident light incident in this manner.

<Chip Wiring Connection Imaging Device and Substrate in FIG. 1>

Detail of the chip wiring 17 which connects the imaging device 16 and the substrate 15 will be described next with reference to FIG. 2. FIG. 2 is an enlarged view of a portion at which the chip wiring 17 which connects the imaging device 16 and the substrate 15 is provided, an upper part of FIG. 2 illustrates a configuration of only the imaging device 16, and a lower part of FIG. 2 illustrates a state where the imaging device 16 is connected to the substrate 15.

As illustrated in the upper part of FIG. 2, in the semiconductor apparatus constituted with the imaging device 16, at an end portion of the chip substrate 16 a, a side electrode 16 c is provided at a side face of the chip substrate 16 a forming the imaging device 16, along with an electrode pad 16 b provided on a front face and a rear face (not illustrated).

According to such a configuration, as illustrated in the lower part of FIG. 2, the electrode pad 15 b provided on the substrate 15 is electrically connected to the side electrode 16 c by being connected through the chip wiring 17 formed with solder.

As a result, because the electrode pad 15 b is not connected to the electrode pad 16 b through wire bonding as in related art, space required for installing a wire is not required, which makes it possible to reduce a connection portion, it is possible to realize a thinner and smaller apparatus. Further, because the electrode pads are not connected through wire bonding, it is possible to reduce flare or ghost generated by incident light being reflected at a surface of the wire, so that it is possible to realize higher quality. Still further, concerning the semiconductor apparatus which configures the imaging device 16, because the side face portion is soldered by the chip wiring 17, even when the substrate 15 becomes thinner, it is possible to improve strength by fillet formed through soldering.

<Manufacturing Processing of Imaging Device in FIG. 1>

Manufacturing processing of the imaging device 16 in FIG. 1 will be described next with reference to the flowchart of FIG. 3.

In step S1, a wafer formed with silicon, or the like, which forms a substrate of the imaging device 16 is ground until the wafer has a predetermined thickness. It should be noted that, at this time point, a circuit which configures a plurality of imaging devices 16 and the electrode pad 16 b are formed on the wafer.

In step S2, through-holes are formed at positions at which individual side faces of the chip substrate 16 a of the imaging device 16 are formed on the wafer using a through silicon via (TSV) technique.

In step S3, the through-holes are subjected metal plating processing using copper, nickel, palladium, gold, or the like.

In step S4, a boundary of the wafer is cut along the positions at which the through-holes subjected to metal plating are provided, and individual imaging devices 16 are cut out in units of the chip substrate 16 a. At this time, because by the through-holes being cut along axes of the holes, the portions subjected to metal plating processing are exposed along the axes of the through-holes on the side face of the chip substrate 16 a on which the cut-out imaging devices 16 are formed, and the side electrodes 16 c are formed.

Because the side electrode 16 c is formed through the above processing, as illustrated in FIG. 2, it is possible to electrically connect the imaging device 16 and the substrate 15 with the chip wiring 17.

As a result, because the electrode pad 15 b is not connected to the electrode pad 16 b through wire bonding as in related art, and space required for installing a wire is not required, it is possible to make a connection portion smaller, so that it is possible to realize a thinner and smaller apparatus. Further, because the electrode pad 15 b is not connected to the electrode pad 16 b through wire bonding, it is possible to reduce flare or ghost generated by incident light being reflected at the surface of the wire. Still further, concerning the semiconductor apparatus configuring the imaging device 16, because the side electrode 16 c forming the side face of the chip substrate 16 a is soldered by the chip wiring 17, even when the substrate 15 becomes thinner, it is possible to improve strength by fillet formed through this soldering.

Further, while, in the above description, an example of the semiconductor apparatus which functions as the imaging device 16 has been described, even with a semiconductor apparatus in which other circuits are configured on the substrate and which has other functions, it is possible to provide the same advantageous effects by configuring a side electrode on a side face of the chip using the a method similar to the method described above.

2. MODIFIED EXAMPLE

While, in the above description, an example where the opening portion 15 a is provided at the substrate 15 and the imaging device is connected to the lower portion of the substrate 15 in FIG. 1 has been described, for example, as illustrated in an upper part of FIG. 4, it is also possible to provide the imaging device 16 on the substrate 15. Also in this case, at the substrate 15, the side electrode 16 c of the imaging device 16 is connected to the electrode pad 15 b of the substrate 15 through the chip wiring 17.

Further, while, in the above description, an example where the lens barrel portion 11 including the optical system block 12 is mounted on the glass plate 13 has been described, the optical system block 12 may be mounted on a frame provided on the substrate 15.

That is, as illustrated in a middle part and a lower part of FIG. 4, the optical system block 12 is mounted on the frame 31 provided on the substrate 15. Also in this case, at the substrate 15, the side electrode 16 c of the imaging device 16 is connected to the electrode pad 15 b of the substrate 15 through the chip wiring 17. It should be noted that, in the middle part of FIG. 4, the opening portion 15 a is provided at the substrate 15, and the imaging device 16 is mounted at the corresponding position at the lower portion in the drawing of the substrate 15. Further, in a lower part of FIG. 4, the opening portion 15 a is not provided at the substrate 15, and the imaging device 16 is mounted at the corresponding position at the upper portion in the drawing of the substrate 15.

In either case, advantageous effects which are the same as those described above are provided.

The present technology is not limited to the above-described embodiments, but various modifications are possible insofar as they are within the scope of the present technology.

Additionally, the present technology may also be configured as below.

(1) A semiconductor apparatus including:

a chip substrate including a predetermined circuit; and

an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside,

wherein the electrode terminal is provided on a side face of the chip substrate.

(2) The semiconductor apparatus according to (1), further including:

the electrode pad at an end portion of both or at least one of a front face and a rear face of the chip substrate, at a position corresponding to the electrode terminal provided on the side face of the chip substrate.

(3) A solid state imaging device including:

a chip substrate including a circuit of an imaging device; and

an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside,

wherein the electrode terminal is provided on a side face of the chip substrate.

(4) The solid state imaging device according to (3), further including:

the electrode pad at an end portion of both or at least one of a front face and a rear face of the chip substrate, at a position corresponding to the electrode terminal provided on the side face of the chip substrate.

(5) An imaging apparatus including:

a chip substrate including a circuit of an imaging device; and

an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside,

wherein the electrode terminal is provided on a side face of the chip substrate.

(6) The imaging apparatus according to (5), further including:

the electrode pad at an end portion of both or at least one of a front face and a rear face of the chip substrate, at a position corresponding to the electrode terminal provided on the side face of the chip substrate.

(7) Electronic equipment including:

a chip substrate including a circuit of an imaging device; and

an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside,

wherein the electrode terminal is provided on a side face of the chip substrate.

(8) The electronic equipment according to (7), further including:

an electrode pad at an end portion of both or at least one of a front face and a rear face of the chip substrate, at a position corresponding to the electrode terminal provided on the side face of the chip substrate.

(9) A manufacturing method of a semiconductor apparatus including

a chip substrate including a predetermined circuit, and

an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside,

the electrode terminal being provided on a side face of the chip substrate, the manufacturing method including:

a first step of forming a through-hole on the side face of the chip substrate, at a position on the wafer on which the electrode terminal is formed;

a second step of applying metal forming the electrode terminal to the through-hole; and

a third step of cutting out the chip substrate by cutting the wafer along the through-hole.

(10) A manufacturing method of a solid state imaging device including

a chip substrate including a circuit of an imaging device, and

an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside,

the electrode terminal being provided on a side face of the chip substrate,

the manufacturing method including:

a first step of forming a through-hole on the side face of the chip substrate, at a position on the wafer on which the electrode terminal is formed;

a second step of applying metal forming the electrode terminal to the through-hole; and

a third step of cutting out the chip substrate by cutting the wafer along the through-hole.

(11) A manufacturing method of an imaging apparatus including

a chip substrate including a circuit of an imaging device, and

an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside,

the electrode terminal being provided on a side face of the chip substrate,

the manufacturing method including:

a first step of forming a through-hole on the side face of the chip substrate, at a position on the wafer on which the electrode terminal is formed;

a second step of applying metal forming the electrode terminal to the through-hole; and

a third step of cutting out the chip substrate by cutting the wafer along the through-hole.

(12) A manufacturing method of electronic equipment including

a chip substrate including a circuit of an imaging device, and

an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside,

the electrode terminal being provided on a side face of the chip substrate,

the manufacturing method including:

a first step of forming a through-hole on the side face of the chip substrate, at a position on the wafer on which the electrode terminal is formed;

a second step of applying metal forming the electrode terminal to the through-hole; and

a third step of cutting out the chip substrate by cutting the wafer along the through-hole.

REFERENCE SIGNS LIST

-   11 lens barrel portion -   12 optical system block -   13 glass plate -   14 adhesive -   15 substrate -   15 a opening portion -   15 a electrode pad -   16 imaging device -   16 a chip substrate -   16 b electrode pad -   16 c side electrode -   17 chip wiring -   31 frame 

1. A semiconductor apparatus comprising: a chip substrate including a predetermined circuit; and an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside, wherein the electrode terminal is provided on a side face of the chip substrate.
 2. The semiconductor apparatus according to claim 1, further comprising: the electrode pad at an end portion of both or at least one of a front face and a rear face of the chip substrate, at a position corresponding to the electrode terminal provided on the side face of the chip substrate.
 3. A solid state imaging device comprising: a chip substrate including a circuit of an imaging device; and an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside, wherein the electrode terminal is provided on a side face of the chip substrate.
 4. The solid state imaging device according to claim 3, further comprising: the electrode pad at an end portion of both or at least one of a front face and a rear face of the chip substrate, at a position corresponding to the electrode terminal provided on the side face of the chip substrate.
 5. An imaging apparatus comprising: a chip substrate including a circuit of an imaging device; and an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside, wherein the electrode terminal is provided on a side face of the chip substrate.
 6. The imaging apparatus according to claim 5, further comprising: the electrode pad at an end portion of both or at least one of a front face and a rear face of the chip substrate, at a position corresponding to the electrode terminal provided on the side face of the chip substrate.
 7. Electronic equipment comprising: a chip substrate including a circuit of an imaging device; and an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside, wherein the electrode terminal is provided on a side face of the chip substrate.
 8. The electronic equipment according to claim 7, further comprising: an electrode pad at an end portion of both or at least one of a front face and a rear face of the chip substrate, at a position corresponding to the electrode terminal provided on the side face of the chip substrate.
 9. A manufacturing method of a semiconductor apparatus including a chip substrate including a predetermined circuit, and an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside, the electrode terminal being provided on a side face of the chip substrate, the manufacturing method comprising: a first step of forming a through-hole on the side face of the chip substrate, at a position on the wafer on which the electrode terminal is formed; a second step of applying metal forming the electrode terminal to the through-hole; and a third step of cutting out the chip substrate by cutting the wafer along the through-hole.
 10. A manufacturing method of a solid state imaging device including a chip substrate including a circuit of an imaging device, and an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside, the electrode terminal being provided on a side face of the chip substrate, the manufacturing method comprising: a first step of forming a through-hole on the side face of the chip substrate, at a position on the wafer on which the electrode terminal is formed; a second step of applying metal forming the electrode terminal to the through-hole; and a third step of cutting out the chip substrate by cutting the wafer along the through-hole.
 11. A manufacturing method of an imaging apparatus including a chip substrate including a circuit of an imaging device, and an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside, the electrode terminal being provided on a side face of the chip substrate, the manufacturing method comprising: a first step of forming a through-hole on the side face of the chip substrate, at a position on the wafer on which the electrode terminal is formed; a second step of applying metal forming the electrode terminal to the through-hole; and a third step of cutting out the chip substrate by cutting the wafer along the through-hole.
 12. A manufacturing method of electronic equipment including a chip substrate including a circuit of an imaging device, and an electrode terminal configured to receive supply of an electrical signal or power supplied from outside or supply an electrical signal or power to be outputted to the outside, the electrode terminal being provided on a side face of the chip substrate, the manufacturing method comprising: a first step of forming a through-hole on the side face of the chip substrate, at a position on the wafer on which the electrode terminal is formed; a second step of applying metal forming the electrode terminal to the through-hole; and a third step of cutting out the chip substrate by cutting the wafer along the through-hole. 